The Nano-Observer II represents a significant advancement in Atomic Force Microscopy (AFM) technology, offering comprehensive capabilities for nanoscale imaging and characterization. This instrument combines high-performance specifications with innovative features designed to accommodate both experienced researchers and new users in the field of nanotechnology.
Technical Specifications and Capabilities
Core System Architecture
- 24-bit low-noise USB controller integration
- Advanced lock-in amplification system for enhanced phase detection
- Specialized modes: EFM/MFM/KFM and PFM capabilities
- Versatile scanning range without head modification requirement
AutoScan Technology
The system incorporates sophisticated AutoScan software that streamlines the imaging process through:
- Automated parameter optimization protocols
- Advanced electronic control systems
- Comprehensive parameter customization options for experienced users
- Simplified three-click operation for standard imaging procedures
Optical and Mechanical Design
- Compact AFM head featuring pre-positioned tip system
- Optimized optical path configuration
- Dual-view capability (top and side) of the tip/sample interface
- Enhanced sample accessibility for efficient specimen manipulation
Advanced Characterization Modes
ResiScope™ III Technology
The ResiScope™ III capability enables precise electrical resistance measurements across a remarkable dynamic range (102 to 1012 ohms), facilitating:
- High-resolution electrical characterization
- Comprehensive materials analysis
- Advanced semiconductor investigation
- Detailed photovoltaic material examination
HD-KFM™ III Implementation
The High Definition Kelvin Force Microscopy (HD-KFM™ III) mode delivers:
- Enhanced spatial resolution for surface potential mapping
- Superior sensitivity for detailed electronic characterization
- Specialized capabilities for 2D material analysis
- Advanced semiconductor and polymer investigation protocols
Soft IC Mode Framework
This innovative third AFM mode combines:
- Dynamic capabilities of resonant modes
- Contact AFM precision
- Minimal sample perturbation
- Extended functionality through specialized sub-modes:
- Soft Meka for mechanical property mapping
- Soft PFM for piezoresponse analysis
- Soft ResiScope for electrical characterization
- Soft SThM for thermal property investigation
Research Applications
The Nano-Observer II finds critical applications across multiple scientific domains:
- Advanced materials characterization
- Semiconductor device analysis
- Photovoltaic technology development
- Electrochemical system investigation
- Corrosion mechanism studies
- Polymer science research
- Biological specimen examination
- 2D materials investigation
Technical Advantages
The instrument’s design philosophy emphasizes:
- Consistent high-resolution imaging across varying scan sizes
- Minimal noise interference in measurement protocols
- Enhanced operational efficiency through automated procedures
- Comprehensive data acquisition capabilities
- Advanced analysis tools for multi-parameter characterization
This advanced AFM system represents a significant step forward in nanoscale characterization technology, offering researchers a powerful tool for conducting detailed materials analysis and advancing scientific understanding across multiple disciplines.
For detailed specifications and technical inquiries, researchers are encouraged to contact CSInstruments directly on:
